Abstract
Our recent study on a challenge of new materials for next generation's magnetic recording approaching an ultra high areal recording density beyond 1 Tbit/in.2 is overviewed. We proposed novel methods for fabricating high performance magnetic recording heads and media by making the best use of wet (electro- and electroless-deposition) and dry (sputtering) processes. We believe that these results contribute significantly to the progress in magnetic recording and constitute a breakthrough for materializing an unexplored areal recording density beyond 1 Tbit/in.2.
Original language | English |
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Pages (from-to) | 2884-2890 |
Number of pages | 7 |
Journal | Electrochimica Acta |
Volume | 52 |
Issue number | 8 SPEC. ISS. |
DOIs | |
Publication status | Published - 2007 Feb 10 |
Keywords
- Electro-deposition
- Electroless-deposition
- Magnetic recording
- Sputtering
- Thin film
ASJC Scopus subject areas
- Chemical Engineering(all)
- Electrochemistry