TY - JOUR
T1 - A large-scale, flip-flop RAM imitating a logic LSI for fast development of process technology
AU - Fujii, Masako
AU - Nii, Koji
AU - Makino, Hiroshi
AU - Ohbayashi, Shigeki
AU - Igarashi, Motoshige
AU - Kawamura, Takeshi
AU - Yokota, Miho
AU - Tsuda, Nobuhiro
AU - Yoshizawa, Tomoaki
AU - Tsutsui, Toshikazu
AU - Takeshita, Naohiko
AU - Murata, Naofumi
AU - Tanaka, Tomohiro
AU - Fujiwara, Takanari
AU - Asahina, Kyoko
AU - Okada, Masakazu
AU - Tomita, Kazuo
AU - Takeuchl, Masahiko
AU - Yamamoto, Shigehisa
AU - Sugimoto, Hiromitsu
AU - Shinohara, Hirofumi
PY - 2008/8
Y1 - 2008/8
N2 - We propose a new large-scale logic test element group (TEG), called a flip-flop RAM (FF-RAM), to improve the total process quality before and during initial mass production. It is designed to be as convenient as an SRAM for measurement and to imitate a logic LSI. We implemented a 10 Mgates FF-RAM using our 65-nm CMOS process. The FF-RAM enables us to make fail-bit maps (FBM) of logic cells because of its cell array structure as an SRAM. An FF-RAM has an additional structure to detect the open and short failure of upper metal layers. The test results show that it can detect failure locations and layers effortlessly using FBMs. We measured and analyzed it for both the cell arrays and the upper metal layers. Their results provided many important clues to improve our processes. We also measured the neutron-induced soft error rate (SER) of FF-RAM, which is becoming a serious problem as transistors become smaller. We compared the results of the neutron-induced soft error rate to those of previous generations: 180nm, 130 nm, and 90 nm. Because of this TEG, we can considerably shorten the development period for advanced CMOS technology.
AB - We propose a new large-scale logic test element group (TEG), called a flip-flop RAM (FF-RAM), to improve the total process quality before and during initial mass production. It is designed to be as convenient as an SRAM for measurement and to imitate a logic LSI. We implemented a 10 Mgates FF-RAM using our 65-nm CMOS process. The FF-RAM enables us to make fail-bit maps (FBM) of logic cells because of its cell array structure as an SRAM. An FF-RAM has an additional structure to detect the open and short failure of upper metal layers. The test results show that it can detect failure locations and layers effortlessly using FBMs. We measured and analyzed it for both the cell arrays and the upper metal layers. Their results provided many important clues to improve our processes. We also measured the neutron-induced soft error rate (SER) of FF-RAM, which is becoming a serious problem as transistors become smaller. We compared the results of the neutron-induced soft error rate to those of previous generations: 180nm, 130 nm, and 90 nm. Because of this TEG, we can considerably shorten the development period for advanced CMOS technology.
KW - Large-scale integration
KW - Logic circuit fault diagnosis
KW - SRAM
KW - Yield optimization
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U2 - 10.1093/ietele/e91-c.8.1338
DO - 10.1093/ietele/e91-c.8.1338
M3 - Article
AN - SCOPUS:77953525119
SN - 0916-8524
VL - E91-C
SP - 1338
EP - 1347
JO - IEICE Transactions on Electronics
JF - IEICE Transactions on Electronics
IS - 8
ER -