@inproceedings{9ad4a26bafd5404898e9b997ce41a875,
title = "A new electrodeposition process of crystalline silicon utilizing water-soluble KF-KCl molten salt",
abstract = "Toward the establishment of a new electrodeposition process of Si, the optimum conditions for obtaining adherent, compact and smooth Si film in molten KF-KCl-K2SiF6 were investigated. Galvanostatic electrolysis was conducted on an Ag substrate in eutectic KF-KCl (45:55 mol%) with various current densities (10- 500 mA cm-2) and K2SiF6 concentrations (0.50-5.0 mol%) at 923 K. Cross-sectional SEM observation of the deposits revealed that compact and smooth Si films form at intermediate K2SiF6 concentration and current density. The morphology of the Si deposit changed into nodular at higher current density. At lower current density, detachment of Si layer from the Ag substrate occurred during the water washing. The relationship between the deposition conditions and Si morphology is discussed from the view point of electrodeposition mechanism.",
author = "Kazuma Maeda and Kouji Yasuda and Toshiyuki Nohira and Rika Hagiwara and Takayuki Homma",
note = "Publisher Copyright: Copyright {\textcopyright} 2014 by The Electrochemical Society. All rights reserved.; 19th International Symposium on Molten Salts and Ionic Liquids, MS and IL 2014, part of the Joint Meeting of the 226th ECS Meeting and 29th SMEQ Meeting ; Conference date: 05-10-2014 Through 09-10-2014",
year = "2014",
doi = "10.1149/06404.0285ecst",
language = "English",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "4",
pages = "285--291",
editor = "{De Long}, {Hugh C.} and Reichert, {W. Matthew} and Trulove, {Paul C.} and Haverhals, {Luke M.} and Minoru Mizuhata and Mantz, {Robert A.} and Adriana Ispas and Andreas Bund",
booktitle = "Molten Salts and Ionic Liquids 19",
edition = "4",
}