A novel fabrication of in-channel 3-D micromesh structure using maskless multi-angle exposure and its microfilter application

Hironobu Sato*, Takayuki Kakinuma, Jeung Sang Go, Shuichi Shoji

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

44 Citations (Scopus)

Abstract

This paper presents a novel fabrication method of in-channel three-dimensional micromesh structures using the conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Numbers of exposure and irradiation angle decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of Micro Total Analysis System (μTAS), the microfilter was fabricated and its filtering property was demonstrated.

Original languageEnglish
Pages223-226
Number of pages4
Publication statusPublished - 2003 Jul 23
EventIEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems - Kyoto, Japan
Duration: 2003 Jan 192003 Jan 23

Conference

ConferenceIEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems
Country/TerritoryJapan
CityKyoto
Period03/1/1903/1/23

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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