Abstract
This paper presents a novel fabrication method of in-channel three-dimensional micromesh structures using the conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Numbers of exposure and irradiation angle decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of Micro Total Analysis System (μTAS), the microfilter was fabricated and its filtering property was demonstrated.
Original language | English |
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Pages | 223-226 |
Number of pages | 4 |
Publication status | Published - 2003 Jul 23 |
Event | IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems - Kyoto, Japan Duration: 2003 Jan 19 → 2003 Jan 23 |
Conference
Conference | IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems |
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Country/Territory | Japan |
City | Kyoto |
Period | 03/1/19 → 03/1/23 |
ASJC Scopus subject areas
- Control and Systems Engineering
- Mechanical Engineering
- Electrical and Electronic Engineering