A two-dimensional anisotropic wet etching simulator for quartz crystal

Meng Zhao; Jiani Wang; Hiroshi Oigawa; Jing Ji; Hisanori Hayashi; Toshitsugu Ueda

doi:10.1541/ieejsmas.131.185

A two-dimensional anisotropic wet etching simulator for quartz crystal

Meng Zhao^*, Jiani Wang, Hiroshi Oigawa, Jing Ji, Hisanori Hayashi, Toshitsugu Ueda

^*Corresponding author for this work

Information, Production and Systems Research Center

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for user's convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.

Original language	English
Pages (from-to)	185-188
Number of pages	4
Journal	IEEJ Transactions on Sensors and Micromachines
Volume	131
Issue number	5
DOIs	https://doi.org/10.1541/ieejsmas.131.185
Publication status	Published - 2011

Keywords

Anisotropic etching
Micromaching
Quartz crystal

ASJC Scopus subject areas

Electrical and Electronic Engineering
Mechanical Engineering

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10.1541/ieejsmas.131.185

Cite this

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abstract = "We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for user's convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.",

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AU - Zhao, Meng

AU - Wang, Jiani

AU - Oigawa, Hiroshi

AU - Ji, Jing

AU - Hayashi, Hisanori

AU - Ueda, Toshitsugu

PY - 2011

Y1 - 2011

N2 - We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for user's convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.

AB - We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for user's convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.

KW - Anisotropic etching

KW - Micromaching

KW - Quartz crystal

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A two-dimensional anisotropic wet etching simulator for quartz crystal

Abstract

Keywords

ASJC Scopus subject areas

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