A two-dimensional anisotropic wet etching simulator for quartz crystal

Meng Zhao*, Jiani Wang, Hiroshi Oigawa, Jing Ji, Hisanori Hayashi, Toshitsugu Ueda

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for user's convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.

Original languageEnglish
Pages (from-to)185-188
Number of pages4
JournalIEEJ Transactions on Sensors and Micromachines
Issue number5
Publication statusPublished - 2011


  • Anisotropic etching
  • Micromaching
  • Quartz crystal

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Mechanical Engineering


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