TY - JOUR
T1 - Ablation threshold and crater morphology of amorphous and crystalline SiO2 glass for extreme ultraviolet femtosecond pulses
AU - Shibuya, T.
AU - Sakaue, K.
AU - Ogawa, H.
AU - Dinh, T. H.
AU - Satoh, D.
AU - Terasawa, E.
AU - Washio, M.
AU - Tanaka, M.
AU - Higashiguchi, T.
AU - Ishino, M.
AU - Kubota, Y.
AU - Inubushi, Y.
AU - Owada, S.
AU - Nishikino, M.
AU - Kobayashi, Y.
AU - Kuroda, R.
N1 - Funding Information:
This work is based on results obtained from the New Energy and Industrial Technology Development Organization (NEDO) project, “Development of advanced laser processing with intelligence based on high-brightness and high-efficiency laser technologies (TACMI project).” The XFEL experiments were performed at the BL1 lab of the SPring-8 Angstrom Compact Free Electron Laser (SACLA) with the approval of the Japan Synchrotron Radiation Research Institute (JASRI) (Proposal No. 2018A8024, 2018B8024). The authors would like to thank Dr. Kon (JASRI) for their support in the experiments at SACLA-BL1.
Publisher Copyright:
© 2020 The Japan Society of Applied Physics
PY - 2020/12/1
Y1 - 2020/12/1
N2 - The ablation threshold fluence and crater morphology of amorphous and crystalline SiO2 glass were analyzed in the regime of an extreme ultraviolet femtosecond pulse. Despite the difference between the densities (or optical penetration depths) of amorphous and crystalline SiO2 glass, the ablation threshold fluences and crater morphologies were found to be comparable. In addition, we compared our experimental results at a 10.3 nm wavelength with those in a previous work at a 13.5 nm wavelength. We conclude that the impact of the difference in density or optical penetration depth of several tens of percent on the ablation process is limited.
AB - The ablation threshold fluence and crater morphology of amorphous and crystalline SiO2 glass were analyzed in the regime of an extreme ultraviolet femtosecond pulse. Despite the difference between the densities (or optical penetration depths) of amorphous and crystalline SiO2 glass, the ablation threshold fluences and crater morphologies were found to be comparable. In addition, we compared our experimental results at a 10.3 nm wavelength with those in a previous work at a 13.5 nm wavelength. We conclude that the impact of the difference in density or optical penetration depth of several tens of percent on the ablation process is limited.
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U2 - 10.35848/1347-4065/abc85a
DO - 10.35848/1347-4065/abc85a
M3 - Article
AN - SCOPUS:85097197595
SN - 0021-4922
VL - 59
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 12
M1 - 122004
ER -