TY - GEN
T1 - Accurate extraction of kt2of piezoelectric film/substrate structure by conversion loss method for subtracting experimental acoustic losses in the substrate
AU - Tatsumi, Ryota
AU - Yanagitani, Takahiko
N1 - Funding Information:
This work was supported by the JST CREST (No. JPMJCR20Q1) and KAKENHI (Grant-in-Aid for Scientific Research No.19H02202, and No.18K19037).
Publisher Copyright:
© 2020 IEEE.
PY - 2020/9/7
Y1 - 2020/9/7
N2 - Electromechanical coupling coefficient (pmb{k}{mathbf{t}}{}-{mathbf{2}}) is an important parameter for determining the performances of RF BAW filter. The IEEE standard recommends a resonance-antiresonance method for determining the pmb{k}{mathbf{t}}{}-{mathbf{2}} of the piezoelectric films by using a self-standing film structure. The method for determining pmb{k}{mathbf{t}}{}-{mathbf{2}} from the film/wafer structure reduces the time and cost of wafer etching process. pmb{k}{mathbf{t}}{}-{mathbf{2}} is underestimated due to the acoustic losses in the substrate in the conventional conversion loss method, which can extract the pmb{k}{mathbf{t}}{}-{mathbf{2}} from HBAR. In this study, we introduce a method for subtracting the acoustic losses in the substrate.
AB - Electromechanical coupling coefficient (pmb{k}{mathbf{t}}{}-{mathbf{2}}) is an important parameter for determining the performances of RF BAW filter. The IEEE standard recommends a resonance-antiresonance method for determining the pmb{k}{mathbf{t}}{}-{mathbf{2}} of the piezoelectric films by using a self-standing film structure. The method for determining pmb{k}{mathbf{t}}{}-{mathbf{2}} from the film/wafer structure reduces the time and cost of wafer etching process. pmb{k}{mathbf{t}}{}-{mathbf{2}} is underestimated due to the acoustic losses in the substrate in the conventional conversion loss method, which can extract the pmb{k}{mathbf{t}}{}-{mathbf{2}} from HBAR. In this study, we introduce a method for subtracting the acoustic losses in the substrate.
KW - Electromechanical coupling coefficient
KW - HBAR
KW - Piezoelectric film
KW - Resonant frequency
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U2 - 10.1109/IUS46767.2020.9251360
DO - 10.1109/IUS46767.2020.9251360
M3 - Conference contribution
AN - SCOPUS:85097872654
T3 - IEEE International Ultrasonics Symposium, IUS
BT - IUS 2020 - International Ultrasonics Symposium, Proceedings
PB - IEEE Computer Society
T2 - 2020 IEEE International Ultrasonics Symposium, IUS 2020
Y2 - 7 September 2020 through 11 September 2020
ER -