Adsorption of organic molecules by photochemical reaction on Cl:Si(1 1 1) and H:Si(1 1 1) evaluated by HREELS

Katsuhiko Nishiyama*, Yosuke Tanaka, Hiroshi Harada, Taro Yamada, Daisuke Niwa, Tomoyuki Inoue, Takayuki Homma, Tetsuya Osaka, Isao Taniguchi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)


The covalent attachment of alkyl groups to silicon surfaces, via carbon-silicon bond formation, has been attempted using gas-surface reactions starting from Cl-terminated Si(1 1 1) or H:Si(1 1 1) under ultraviolet light irradiation. The formation of Cl-terminated Si(1 1 1) and its resulting stability were examined prior to deposition of organic molecules. High-resolution electron energy loss spectroscopy (HREELS) was utilized for detecting surface-bound adsorbates. The detection of photo-deposited organic species on Cl:Si(1 1 1) from gas-phase CH4 or CH2{double bond, long}CH2 was not significant. On H:Si(1 1 1), it was evident that after the photoreaction with gas-phase C2H5Cl, C2H5 groups were chemically bonded to the surface Si atoms through single covalent bonds. The C2H5 groups were thermally stable at temperatures below 600 K. Alkyl monolayers prepared on silicon surfaces by dry process will lead to a new prospective technology of nanoscale fabrication and biochemical applications.

Original languageEnglish
Pages (from-to)1965-1972
Number of pages8
JournalSurface Science
Issue number10
Publication statusPublished - 2006 May 15


  • Alkyl adsorbate
  • C-Si covalent bond
  • Chlorine-terminated Si(1 1 1)
  • Hydrogen-terminated Si(1 1 1)
  • Photochemical reaction

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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