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Advanced ion implantation and rapid thermal annealing technologies for highly reliable 0.25μm dual gate CMOS
S. Shimizu*, T. Kuroi, Y. Kawasaki, T. Tsutsumi, H. Oda, M. Inuishi, H. Miyoshi
*Corresponding author for this work
Research output: Contribution to journal › Conference article › peer-review
2
Citations
(Scopus)