AFM Tip Characterizer fabricated by Si/SiO2 multilayers

Hisataka Takenaka; Masatoshi Hatayama; Hisashi Ito; Tadayuki Ohchi; Akio Takano; Satoru Kurosawa; Hiroshi Itoh; Shingo Ichimura

doi:10.1380/ejssnt.2011.293

AFM Tip Characterizer fabricated by Si/SiO₂ multilayers

Hisataka Takenaka^*, Masatoshi Hatayama, Hisashi Ito, Tadayuki Ohchi, Akio Takano, Satoru Kurosawa, Hiroshi Itoh, Shingo Ichimura

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO₂ multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO₂ multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

Original language	English
Pages (from-to)	293-296
Number of pages	4
Journal	e-Journal of Surface Science and Nanotechnology
Volume	9
DOIs	https://doi.org/10.1380/ejssnt.2011.293
Publication status	Published - 2011 Jul 16
Externally published	Yes

Keywords

Atomic force microscopy
Multilayer
Tip characterizer

ASJC Scopus subject areas

Biotechnology
Bioengineering
Condensed Matter Physics
Mechanics of Materials
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1380/ejssnt.2011.293

Cite this

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AU - Takenaka, Hisataka

AU - Hatayama, Masatoshi

AU - Ito, Hisashi

AU - Ohchi, Tadayuki

AU - Takano, Akio

AU - Kurosawa, Satoru

AU - Itoh, Hiroshi

AU - Ichimura, Shingo

PY - 2011/7/16

Y1 - 2011/7/16

N2 - An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

AB - An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

KW - Atomic force microscopy

KW - Multilayer

KW - Tip characterizer

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