AFM Tip Characterizer fabricated by Si/SiO2 multilayers

Hisataka Takenaka*, Masatoshi Hatayama, Hisashi Ito, Tadayuki Ohchi, Akio Takano, Satoru Kurosawa, Hiroshi Itoh, Shingo Ichimura

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

Original languageEnglish
Pages (from-to)293-296
Number of pages4
Journale-Journal of Surface Science and Nanotechnology
Publication statusPublished - 2011 Jul 16
Externally publishedYes


  • Atomic force microscopy
  • Multilayer
  • Tip characterizer

ASJC Scopus subject areas

  • Biotechnology
  • Bioengineering
  • Condensed Matter Physics
  • Mechanics of Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


Dive into the research topics of 'AFM Tip Characterizer fabricated by Si/SiO2 multilayers'. Together they form a unique fingerprint.

Cite this