An optical grating filter dry-etched on a LiNbO3 substrate

Satoshi Shinada; Tetsuya Kawanishi; Takahide Sakamoto; Masayuki Izutsu

doi:10.1587/elex.3.347

An optical grating filter dry-etched on a LiNbO₃ substrate

Satoshi Shinada^*, Tetsuya Kawanishi, Takahide Sakamoto, Masayuki Izutsu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

We fabricated an etched grating filter on a Ti-diffused waveguide in LiNbO₃ using inductively coupled plasma etching with C ₄F₈/Ar as an etching gas, which has an etching rate of 85.1 nm/min. The etched grating filter had a reflectivity of 35% and a bandwidth of 0.02 nm. Maximum reflectivity was obtained when the electric field of an incident beam was perpendicular to the grating.

Original language	English
Pages (from-to)	347-352
Number of pages	6
Journal	ieice electronics express
Volume	3
Issue number	14
DOIs	https://doi.org/10.1587/elex.3.347
Publication status	Published - 2006 Jul 25
Externally published	Yes

Keywords

Dry etching, grating
ICP
LiNbO

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering

Access to Document

10.1587/elex.3.347

Cite this

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abstract = "We fabricated an etched grating filter on a Ti-diffused waveguide in LiNbO3 using inductively coupled plasma etching with C 4F8/Ar as an etching gas, which has an etching rate of 85.1 nm/min. The etched grating filter had a reflectivity of 35% and a bandwidth of 0.02 nm. Maximum reflectivity was obtained when the electric field of an incident beam was perpendicular to the grating.",

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AB - We fabricated an etched grating filter on a Ti-diffused waveguide in LiNbO3 using inductively coupled plasma etching with C 4F8/Ar as an etching gas, which has an etching rate of 85.1 nm/min. The etched grating filter had a reflectivity of 35% and a bandwidth of 0.02 nm. Maximum reflectivity was obtained when the electric field of an incident beam was perpendicular to the grating.

KW - Dry etching, grating

KW - ICP

KW - LiNbO

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