An optical grating filter dry-etched on a LiNbO3 substrate

Satoshi Shinada*, Tetsuya Kawanishi, Takahide Sakamoto, Masayuki Izutsu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


We fabricated an etched grating filter on a Ti-diffused waveguide in LiNbO3 using inductively coupled plasma etching with C 4F8/Ar as an etching gas, which has an etching rate of 85.1 nm/min. The etched grating filter had a reflectivity of 35% and a bandwidth of 0.02 nm. Maximum reflectivity was obtained when the electric field of an incident beam was perpendicular to the grating.

Original languageEnglish
Pages (from-to)347-352
Number of pages6
Journalieice electronics express
Issue number14
Publication statusPublished - 2006 Jul 25
Externally publishedYes


  • Dry etching, grating
  • ICP
  • LiNbO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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