Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

M. Zhao; H. Oigawa; J. Ji; T. Ueda

doi:10.1109/ICSENS.2011.6127322

Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

M. Zhao^*, H. Oigawa, J. Ji, T. Ueda

^*Corresponding author for this work

Information, Production and Systems Research Center

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.

Original language	English
Title of host publication	Proceedings of IEEE Sensors
Pages	1693-1696
Number of pages	4
DOIs	https://doi.org/10.1109/ICSENS.2011.6127322
Publication status	Published - 2011
Event	10th IEEE SENSORS Conference 2011, SENSORS 2011 - Limerick Duration: 2011 Oct 28 → 2011 Oct 31

Other

Other	10th IEEE SENSORS Conference 2011, SENSORS 2011
City	Limerick
Period	11/10/28 → 11/10/31

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1109/ICSENS.2011.6127322

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title = "Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer",

abstract = "This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.",

author = "M. Zhao and H. Oigawa and J. Ji and T. Ueda",

year = "2011",

doi = "10.1109/ICSENS.2011.6127322",

language = "English",

isbn = "9781424492886",

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AU - Zhao, M.

AU - Oigawa, H.

AU - Ji, J.

AU - Ueda, T.

PY - 2011

Y1 - 2011

N2 - This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.

AB - This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.

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DO - 10.1109/ICSENS.2011.6127322

M3 - Conference contribution

AN - SCOPUS:84856845724

SN - 9781424492886

SP - 1693

EP - 1696

BT - Proceedings of IEEE Sensors

T2 - 10th IEEE SENSORS Conference 2011, SENSORS 2011

Y2 - 28 October 2011 through 31 October 2011

ER -

Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

Abstract

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