Application of metal cluster complex ion beam for low damage sputtering

Toshiyuki Fujimoto; Takeshi Mizota; Hidehiko Nonaka; Akira Kurokawa; Shingo Ichimura

doi:10.1002/sia.1955

Application of metal cluster complex ion beam for low damage sputtering

Toshiyuki Fujimoto^*, Takeshi Mizota, Hidehiko Nonaka, Akira Kurokawa, Shingo Ichimura

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

Original language	English
Pages (from-to)	164-166
Number of pages	3
Journal	Surface and Interface Analysis
Volume	37
Issue number	2
DOIs	https://doi.org/10.1002/sia.1955
Publication status	Published - 2005 Feb
Externally published	Yes

Keywords

Cluster ion bean
Low damage sputtering
Metal cluster complex

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1002/sia.1955

Cite this

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title = "Application of metal cluster complex ion beam for low damage sputtering",

abstract = "Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.",

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author = "Toshiyuki Fujimoto and Takeshi Mizota and Hidehiko Nonaka and Akira Kurokawa and Shingo Ichimura",

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doi = "10.1002/sia.1955",

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AU - Fujimoto, Toshiyuki

AU - Mizota, Takeshi

AU - Nonaka, Hidehiko

AU - Kurokawa, Akira

AU - Ichimura, Shingo

PY - 2005/2

Y1 - 2005/2

N2 - Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

AB - Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

KW - Cluster ion bean

KW - Low damage sputtering

KW - Metal cluster complex

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JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

IS - 2

ER -

Application of metal cluster complex ion beam for low damage sputtering

Abstract

Keywords

ASJC Scopus subject areas

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