Application of metal cluster complex ion beam for low damage sputtering

Toshiyuki Fujimoto*, Takeshi Mizota, Hidehiko Nonaka, Akira Kurokawa, Shingo Ichimura

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)


Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

Original languageEnglish
Pages (from-to)164-166
Number of pages3
JournalSurface and Interface Analysis
Issue number2
Publication statusPublished - 2005 Feb
Externally publishedYes


  • Cluster ion bean
  • Low damage sputtering
  • Metal cluster complex

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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