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Behavior of ion-implanted As atoms in Si during molybdenum disilicide formation
Iwao Ohdomari*, Toyohiro Chikyow, Hiroshi Kawarada, Kazuo Konuma, Masakazu Kakumu, Kazuhiko Hashimoto, Itsuro Kimura, Kenji Yoneda
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
2
Citations
(Scopus)