Change in surface morphology of polytetrafluoroethylene by reactive ion etching

Tomohiro Takahashi; Yuki Hirano; Yuya Takasawa; Tomoko Gowa; Naoyuki Fukutake; Akihiro Oshima; Seiichi Tagawa; Masakazu Washio

doi:10.1016/j.radphyschem.2010.07.042

Change in surface morphology of polytetrafluoroethylene by reactive ion etching

Tomohiro Takahashi^*, Yuki Hirano, Yuya Takasawa, Tomoko Gowa, Naoyuki Fukutake, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

Polytetrafluoroethylene (PTFE) was exposed to Ar, CF₄, N₂ and O₂ plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF₄, N₂ and O₂ plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF₄ plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.

Original language	English
Pages (from-to)	253-256
Number of pages	4
Journal	Radiation Physics and Chemistry
Volume	80
Issue number	2
DOIs	https://doi.org/10.1016/j.radphyschem.2010.07.042
Publication status	Published - 2011 Feb

Keywords

PTFE
Plasma
Reactive ion etching
Water repellency

ASJC Scopus subject areas

Radiation

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10.1016/j.radphyschem.2010.07.042

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title = "Change in surface morphology of polytetrafluoroethylene by reactive ion etching",

abstract = "Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.",

keywords = "PTFE, Plasma, Reactive ion etching, Water repellency",

author = "Tomohiro Takahashi and Yuki Hirano and Yuya Takasawa and Tomoko Gowa and Naoyuki Fukutake and Akihiro Oshima and Seiichi Tagawa and Masakazu Washio",

note = "Funding Information: A part of this work was supported by “Nanotechnology network project (Handai Multi Functional Nanofoundry)” of the Ministry of Education, Culture, Sports, Science and Technology (MEXT). A part of this work was supported by High-Tech Research Center Project of MEXT HRC707 .",

year = "2011",

month = feb,

doi = "10.1016/j.radphyschem.2010.07.042",

language = "English",

volume = "80",

pages = "253--256",

journal = "Radiation Physics and Chemistry",

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publisher = "Elsevier Limited",

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TY - JOUR

T1 - Change in surface morphology of polytetrafluoroethylene by reactive ion etching

AU - Takahashi, Tomohiro

AU - Hirano, Yuki

AU - Takasawa, Yuya

AU - Gowa, Tomoko

AU - Fukutake, Naoyuki

AU - Oshima, Akihiro

AU - Tagawa, Seiichi

AU - Washio, Masakazu

N1 - Funding Information: A part of this work was supported by “Nanotechnology network project (Handai Multi Functional Nanofoundry)” of the Ministry of Education, Culture, Sports, Science and Technology (MEXT). A part of this work was supported by High-Tech Research Center Project of MEXT HRC707 .

PY - 2011/2

Y1 - 2011/2

N2 - Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.

AB - Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.

KW - PTFE

KW - Plasma

KW - Reactive ion etching

KW - Water repellency

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U2 - 10.1016/j.radphyschem.2010.07.042

DO - 10.1016/j.radphyschem.2010.07.042

M3 - Article

AN - SCOPUS:78649329794

SN - 0969-806X

VL - 80

SP - 253

EP - 256

JO - Radiation Physics and Chemistry

JF - Radiation Physics and Chemistry

IS - 2

ER -

Change in surface morphology of polytetrafluoroethylene by reactive ion etching

Abstract

Keywords

ASJC Scopus subject areas

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