CHARACTERIZATION OF DIAMOND PARTICLES AND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOUR DEPOSITION USING HIGH-VOLTAGE ELECTRON MICROSCOPY.

Hiroshi Kawarada; King Sheng Mar; Jun ichi Suzuki; Toshimichi Ito; Hirotaro Mori; Hiroshi Fujita; Akio Hiraki

CHARACTERIZATION OF DIAMOND PARTICLES AND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOUR DEPOSITION USING HIGH-VOLTAGE ELECTRON MICROSCOPY.

Hiroshi Kawarada^*, King Sheng Mar, Jun ichi Suzuki, Toshimichi Ito, Hirotaro Mori, Hiroshi Fujita, Akio Hiraki

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

The internal and internal structures of diamond particles and films on Si substrates formed by plasma-assisted chemical vapor deposition have been investigated by high-voltage transmission electron microscopy. The feature of line defects - micro-twin lamellae or stacking faults - in a diamond particle indicates the concentric crystal growth originated from one nucleus. The particles are observed to be in direct contact with the Si substrate around the nucleation site within the resolution limit. The particles are stacked up to form a diamond film.

Original language	English
Pages (from-to)	1904-1906
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	26
Issue number	11
Publication status	Published - 1987 Nov
Externally published	Yes

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Cite this

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title = "CHARACTERIZATION OF DIAMOND PARTICLES AND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOUR DEPOSITION USING HIGH-VOLTAGE ELECTRON MICROSCOPY.",

abstract = "The internal and internal structures of diamond particles and films on Si substrates formed by plasma-assisted chemical vapor deposition have been investigated by high-voltage transmission electron microscopy. The feature of line defects - micro-twin lamellae or stacking faults - in a diamond particle indicates the concentric crystal growth originated from one nucleus. The particles are observed to be in direct contact with the Si substrate around the nucleation site within the resolution limit. The particles are stacked up to form a diamond film.",

author = "Hiroshi Kawarada and Mar, {King Sheng} and Suzuki, {Jun ichi} and Toshimichi Ito and Hirotaro Mori and Hiroshi Fujita and Akio Hiraki",

year = "1987",

month = nov,

language = "English",

volume = "26",

pages = "1904--1906",

journal = "Japanese Journal of Applied Physics, Part 2: Letters",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "11",

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T1 - CHARACTERIZATION OF DIAMOND PARTICLES AND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOUR DEPOSITION USING HIGH-VOLTAGE ELECTRON MICROSCOPY.

AU - Kawarada, Hiroshi

AU - Mar, King Sheng

AU - Suzuki, Jun ichi

AU - Ito, Toshimichi

AU - Mori, Hirotaro

AU - Fujita, Hiroshi

AU - Hiraki, Akio

PY - 1987/11

Y1 - 1987/11

N2 - The internal and internal structures of diamond particles and films on Si substrates formed by plasma-assisted chemical vapor deposition have been investigated by high-voltage transmission electron microscopy. The feature of line defects - micro-twin lamellae or stacking faults - in a diamond particle indicates the concentric crystal growth originated from one nucleus. The particles are observed to be in direct contact with the Si substrate around the nucleation site within the resolution limit. The particles are stacked up to form a diamond film.

AB - The internal and internal structures of diamond particles and films on Si substrates formed by plasma-assisted chemical vapor deposition have been investigated by high-voltage transmission electron microscopy. The feature of line defects - micro-twin lamellae or stacking faults - in a diamond particle indicates the concentric crystal growth originated from one nucleus. The particles are observed to be in direct contact with the Si substrate around the nucleation site within the resolution limit. The particles are stacked up to form a diamond film.

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M3 - Article

AN - SCOPUS:0023453203

SN - 0021-4922

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EP - 1906

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

IS - 11

ER -

CHARACTERIZATION OF DIAMOND PARTICLES AND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOUR DEPOSITION USING HIGH-VOLTAGE ELECTRON MICROSCOPY.

Abstract

ASJC Scopus subject areas

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