Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

T. Souno, H. Nishikawa*, M. Hattori, Y. Ohki, E. Watanabe, M. Oikawa, T. Kamiya, K. Arakawa

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

7 Citations (Scopus)


We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.

Original languageEnglish
Pages (from-to)277-280
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Publication statusPublished - 2003 Sept
Event8th International Conference on Nuclear Microprobe Technology - Takasaki, Japan
Duration: 2002 Sept 82002 Sept 13


  • Ion microbeam
  • Photoluminescence
  • Raman scattering
  • Silica

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation


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