Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

Yuya Kajikawa; Suguru Noda; Hiroshi Komiyama

doi:10.1116/1.1619414

Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

Yuya Kajikawa^*, Suguru Noda, Hiroshi Komiyama

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

106 Citations (Scopus)

Abstract

The PO-determining mechanism of reactive-sputter-deposited TiN, AlN, and TaN was studied. Both the existing experimental results for these three materials and the existing models explaining preferred orientation were experimentally studied. The resultant data were analyzed in detail.

Original language	English
Pages (from-to)	1943-1954
Number of pages	12
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	21
Issue number	6
DOIs	https://doi.org/10.1116/1.1619414
Publication status	Published - 2003 Nov
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.1619414

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title = "Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides",

abstract = "The PO-determining mechanism of reactive-sputter-deposited TiN, AlN, and TaN was studied. Both the existing experimental results for these three materials and the existing models explaining preferred orientation were experimentally studied. The resultant data were analyzed in detail.",

author = "Yuya Kajikawa and Suguru Noda and Hiroshi Komiyama",

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Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

Abstract

ASJC Scopus subject areas

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