Correlation between the Carbon Nanotube Growth Rate and Byproducts in Antenna-Type Remote Plasma Chemical Vapor Deposition Observed by Vacuum Ultraviolet Absorption Spectroscopy

Masafumi Inaba; Takumi Ochiai; Kazuyoshi Ohara; Ryogo Kato; Tasuku Maki; Toshiyuki Ohashi; Hiroshi Kawarada

doi:10.1002/smll.201901504

Correlation between the Carbon Nanotube Growth Rate and Byproducts in Antenna-Type Remote Plasma Chemical Vapor Deposition Observed by Vacuum Ultraviolet Absorption Spectroscopy

Masafumi Inaba, Takumi Ochiai, Kazuyoshi Ohara, Ryogo Kato, Tasuku Maki, Toshiyuki Ohashi, Hiroshi Kawarada^*

^*Corresponding author for this work

School of Fundamental Science and Engineering

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

For sp² or sp³ carbon material growth, it is important to investigate the precursors or intermediates just before growth. In this study, the density of ethylene (C₂H₄) outside the plasma discharge space and just before reaching the carbon nanotube (CNT) growth region is investigated by vacuum ultraviolet absorption spectroscopy for plasma discharge in an antenna-type remote plasma chemical vapor deposition with a CH₄/H₂ system, with which the growth of very long (≈0.5 cm) CNT forests is achieved. Single-wall CNT forests have the potential for application as electrodes in battery cells, vertical wiring for high current applications, and thermal interface materials. It is observed that the plasma discharge decomposes the CH₄ source gas and forms C₂H_x species, which reversibly reform to C₂H₄ in the plasma-off state. In addition, the density of the formed C₂H₄ has a strong correlation to the CNT growth rate. Therefore, the C₂H₄ density is a good indicator of the density of C₂H_x species for CNT growth in the CH₄/H₂ plasma system.

Original language	English
Article number	1901504
Journal	Small
Volume	15
Issue number	48
DOIs	https://doi.org/10.1002/smll.201901504
Publication status	Published - 2019 Nov 1

Keywords

carbon nanotubes
ethylene
plasma enhanced CVD
vacuum ultraviolet
vinyl radicals

ASJC Scopus subject areas

Biotechnology
Biomaterials
Chemistry(all)
Materials Science(all)

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10.1002/smll.201901504

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title = "Correlation between the Carbon Nanotube Growth Rate and Byproducts in Antenna-Type Remote Plasma Chemical Vapor Deposition Observed by Vacuum Ultraviolet Absorption Spectroscopy",

abstract = "For sp2 or sp3 carbon material growth, it is important to investigate the precursors or intermediates just before growth. In this study, the density of ethylene (C2H4) outside the plasma discharge space and just before reaching the carbon nanotube (CNT) growth region is investigated by vacuum ultraviolet absorption spectroscopy for plasma discharge in an antenna-type remote plasma chemical vapor deposition with a CH4/H2 system, with which the growth of very long (≈0.5 cm) CNT forests is achieved. Single-wall CNT forests have the potential for application as electrodes in battery cells, vertical wiring for high current applications, and thermal interface materials. It is observed that the plasma discharge decomposes the CH4 source gas and forms C2Hx species, which reversibly reform to C2H4 in the plasma-off state. In addition, the density of the formed C2H4 has a strong correlation to the CNT growth rate. Therefore, the C2H4 density is a good indicator of the density of C2Hx species for CNT growth in the CH4/H2 plasma system.",

keywords = "carbon nanotubes, ethylene, plasma enhanced CVD, vacuum ultraviolet, vinyl radicals",

author = "Masafumi Inaba and Takumi Ochiai and Kazuyoshi Ohara and Ryogo Kato and Tasuku Maki and Toshiyuki Ohashi and Hiroshi Kawarada",

note = "Funding Information: This study was supported by a Research Fellowship for Young Scientists (Grant Number JP17J08746) and a Grant-in-Aid for Young Scientists (Grant Number JP18K13787) from the Japan Society for the Promotion of Science (JSPS), and Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development. The authors thank Edanz Group (www.edanzediting.com/ac) for editing a draft of this manuscript. Publisher Copyright: {\textcopyright} 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim",

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doi = "10.1002/smll.201901504",

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AU - Inaba, Masafumi

AU - Ochiai, Takumi

AU - Ohara, Kazuyoshi

AU - Kato, Ryogo

AU - Maki, Tasuku

AU - Ohashi, Toshiyuki

AU - Kawarada, Hiroshi

N1 - Funding Information: This study was supported by a Research Fellowship for Young Scientists (Grant Number JP17J08746) and a Grant-in-Aid for Young Scientists (Grant Number JP18K13787) from the Japan Society for the Promotion of Science (JSPS), and Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development. The authors thank Edanz Group (www.edanzediting.com/ac) for editing a draft of this manuscript. Publisher Copyright: © 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

PY - 2019/11/1

Y1 - 2019/11/1

N2 - For sp2 or sp3 carbon material growth, it is important to investigate the precursors or intermediates just before growth. In this study, the density of ethylene (C2H4) outside the plasma discharge space and just before reaching the carbon nanotube (CNT) growth region is investigated by vacuum ultraviolet absorption spectroscopy for plasma discharge in an antenna-type remote plasma chemical vapor deposition with a CH4/H2 system, with which the growth of very long (≈0.5 cm) CNT forests is achieved. Single-wall CNT forests have the potential for application as electrodes in battery cells, vertical wiring for high current applications, and thermal interface materials. It is observed that the plasma discharge decomposes the CH4 source gas and forms C2Hx species, which reversibly reform to C2H4 in the plasma-off state. In addition, the density of the formed C2H4 has a strong correlation to the CNT growth rate. Therefore, the C2H4 density is a good indicator of the density of C2Hx species for CNT growth in the CH4/H2 plasma system.

AB - For sp2 or sp3 carbon material growth, it is important to investigate the precursors or intermediates just before growth. In this study, the density of ethylene (C2H4) outside the plasma discharge space and just before reaching the carbon nanotube (CNT) growth region is investigated by vacuum ultraviolet absorption spectroscopy for plasma discharge in an antenna-type remote plasma chemical vapor deposition with a CH4/H2 system, with which the growth of very long (≈0.5 cm) CNT forests is achieved. Single-wall CNT forests have the potential for application as electrodes in battery cells, vertical wiring for high current applications, and thermal interface materials. It is observed that the plasma discharge decomposes the CH4 source gas and forms C2Hx species, which reversibly reform to C2H4 in the plasma-off state. In addition, the density of the formed C2H4 has a strong correlation to the CNT growth rate. Therefore, the C2H4 density is a good indicator of the density of C2Hx species for CNT growth in the CH4/H2 plasma system.

KW - carbon nanotubes

KW - ethylene

KW - plasma enhanced CVD

KW - vacuum ultraviolet

KW - vinyl radicals

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Correlation between the Carbon Nanotube Growth Rate and Byproducts in Antenna-Type Remote Plasma Chemical Vapor Deposition Observed by Vacuum Ultraviolet Absorption Spectroscopy

Abstract

Keywords

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