TY - GEN
T1 - Coupled Monte Carlo simulation of transient electron-phonon transport in nanoscale devices
AU - Kamakura, Yoshinari
AU - Mori, Nubuya
AU - Taniguchi, Kenji
AU - Zushi, Tomofumi
AU - Watanabe, Takanobu
PY - 2010/12/6
Y1 - 2010/12/6
N2 - Using a coupled Monte Carlo method for solving both electron and phonon Boltzmann transport equations, the transient electrothermal behaviors of nanoscale Si n-i-n device are simulated. The nonequilibrium optical phonon distribution is characterized by a temperature different from that of the acoustic phonons, and these two temperatures show different characteristics not only in the steady state, but also in transient conditions. It has been also suggested that the simulated transient response of the phonon temperatures can be practically described by the equivalent thermal circuit model, which is useful for, e.g., projecting the NBTI lifetime during the realistic circuit operations.
AB - Using a coupled Monte Carlo method for solving both electron and phonon Boltzmann transport equations, the transient electrothermal behaviors of nanoscale Si n-i-n device are simulated. The nonequilibrium optical phonon distribution is characterized by a temperature different from that of the acoustic phonons, and these two temperatures show different characteristics not only in the steady state, but also in transient conditions. It has been also suggested that the simulated transient response of the phonon temperatures can be practically described by the equivalent thermal circuit model, which is useful for, e.g., projecting the NBTI lifetime during the realistic circuit operations.
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U2 - 10.1109/SISPAD.2010.5604561
DO - 10.1109/SISPAD.2010.5604561
M3 - Conference contribution
AN - SCOPUS:78649605356
SN - 9781424476992
T3 - International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
SP - 89
EP - 92
BT - 15th International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2010
T2 - 15th International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2010
Y2 - 6 September 2010 through 8 September 2010
ER -