Deposition of thin nanoporous silica layers on solid surfaces

Makoto Ogawa*, Naoki Shimura, André Ayral

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)


A new and versatile method to prepare nanoporous silica thin layers on a solid substrate was investigated. The deposition of the nanoporous silica layers was conducted using C16TAC, deionized water, methanol, and a 27% aqueous ammonia solution. The nanoporous silica layer with the thickness of about 70 nm and with disordered mesostructure formed on a silicon wafer. The mesoporous silica coating was regarded as a way to impart new functions such as molecular sieving on catalysts and adsorbents. The method is a versatile way to prepare mesoporous silica layers on a flat substrate and to coat particles due to the very simple procedure, mild reaction conditions, and reproducible results.

Original languageEnglish
Pages (from-to)1715-1718
Number of pages4
JournalChemistry of Materials
Issue number7
Publication statusPublished - 2006 Apr 4

ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)


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