Abstract
This paper describes design criteria for high-density low-power static RAM cells with a four-transistor two-resistor configuration. The states of the cell latch are expressed by a dc stability factor introduced from transfer curves of the inverters in the cell. The criteria feature using only static conditions for read/write/retain operations. The designed cell considering mask-misalignment measured 22.8 × 27.6 µm with 2.5 µm layout rules. From the evaluation of dynamic characteristics, it was shown that the 16K RAM using the cell had a sufficient operating margin.
Original language | English |
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Pages (from-to) | 414-418 |
Number of pages | 5 |
Journal | IEEE Journal of Solid-State Circuits |
Volume | 18 |
Issue number | 4 |
DOIs | |
Publication status | Published - 1983 Aug |
Externally published | Yes |
ASJC Scopus subject areas
- Electrical and Electronic Engineering