Detection of C-Si covalent bond in CH3 adsorbate formed by chemical reaction of CH3MgBr and H:Si(111)

Taro Yamada*, Tomoyuki Inoue, Keiko Yamada, Nao Takano, Tetsuya Osaka, Hiroshi Harada, Katsuhiko Nishiyama, Isao Taniguchi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

40 Citations (Scopus)

Abstract

High-resolution electron energy loss spectroscopy (HREELS) yielded evidence for the formation of single covalent bonds between Si(111) surface atoms and CH3 groups from the reaction of CH3MgBr and hydrogen-terminated H:Si(111)(1 × 1). The vibration at 678 cm-1, assigned to the C-Si bond, was isolated within the spectrum of CH3 on deuterium-terminated D:Si(111)(1 × 1). The CH3 groups were thermally stable at temperatures below 600 K. The C-Si bonds are essential for enhancing the usefulness of alkyl moieties, which will lead to a new prospective technology of nanoscale fabrication and biochemical application.

Original languageEnglish
Pages (from-to)8039-8042
Number of pages4
JournalJournal of the American Chemical Society
Volume125
Issue number26
DOIs
Publication statusPublished - 2003 Jul 2

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry

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