@inproceedings{5d242f565be247eab09036436860facb,
title = "Development and applications of a Si nano-photodiode with a surface plasmon antenna",
abstract = "We developed a nano-photodiode that confines and absorbs the sub-wavelength-size optical near field in small-scale silicon. A surface plasmon resonance antenna is used to enhance the near field in silicon. The response time of the nanophotodiodes is shorter than that of conventional photodiodes because the separation between anode and cathode and the size of the electrodes can be as small as one thousandth of that for conventional photodiodes. The full-width at half-maximum of the impulse response of the silicon nano-photodiode was as fast as ∼20 ps even when the bias voltage was less than 1 V. This nano-photodiode technology can be applied to other semiconductor materials such as germanium and ternary compound semiconductors.",
keywords = "Diffraction limit, Nano-optics, Near field, Photodiode, Silicon, Silicon photonics, Surface-plasmons",
author = "Keishi Ohashi and Junichi Fujikata and Tsutomu Ishi and Daisuke Okamoto and Kikuo Makita and Kenichi Nishi",
year = "2006",
month = dec,
day = "27",
doi = "10.1117/12.691553",
language = "English",
isbn = "0819464473",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Optoelectronic Materials and Devices",
note = "Optoelectronic Materials and Devices ; Conference date: 05-09-2006 Through 07-09-2006",
}