Development of a Sub-micron Processing Method with Ion Implantation

Seung Jun Yu; Keita Kawabe; Hideaki Ohkubo; Yoshimichi Ohki; Makoto Fujimaki; Makoto Fujimaki; Masaharu Hattori; Mikiko Saito; Yasuo Wada

doi:10.1541/ieejfms.125.69

Development of a Sub-micron Processing Method with Ion Implantation

Seung Jun Yu, Keita Kawabe, Hideaki Ohkubo, Yoshimichi Ohki, Makoto Fujimaki, Makoto Fujimaki, Masaharu Hattori, Mikiko Saito, Yasuo Wada

Kagami Memorial Research Institute for Materials Science and Technology

Research output: Contribution to journal › Article › peer-review

Abstract

We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.

Original language	English
Pages (from-to)	69-70
Number of pages	2
Journal	The transactions of the Institute of Electrical Engineers of Japan.A
Volume	125
Issue number	1
DOIs	https://doi.org/10.1541/ieejfms.125.69
Publication status	Published - 2005

Keywords

Bragg grating
electroplating
ion implantation
nano-plating
sub-µm processing

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1541/ieejfms.125.69

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abstract = "We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.",

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AU - Yu, Seung Jun

AU - Kawabe, Keita

AU - Ohkubo, Hideaki

AU - Ohki, Yoshimichi

AU - Fujimaki, Makoto

AU - Hattori, Masaharu

AU - Saito, Mikiko

AU - Wada, Yasuo

PY - 2005

Y1 - 2005

N2 - We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.

AB - We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.

KW - Bragg grating

KW - electroplating

KW - ion implantation

KW - nano-plating

KW - sub-µm processing

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Development of a Sub-micron Processing Method with Ion Implantation

Abstract

Keywords

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