Development of a Sub-micron Processing Method with Ion Implantation

Seung Jun Yu, Keita Kawabe, Hideaki Ohkubo, Yoshimichi Ohki, Makoto Fujimaki, Makoto Fujimaki, Masaharu Hattori, Mikiko Saito, Yasuo Wada

Research output: Contribution to journalArticlepeer-review


We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.

Original languageEnglish
Pages (from-to)69-70
Number of pages2
JournalThe transactions of the Institute of Electrical Engineers of Japan.A
Issue number1
Publication statusPublished - 2005


  • Bragg grating
  • electroplating
  • ion implantation
  • nano-plating
  • sub-µm processing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering


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