TY - JOUR
T1 - Development of low-cost mass production process of superrepellent surface using doubly reentrant structure pillar array
AU - Nakanishi, Kanki
AU - Minoshiro, Shigeyuki
AU - Yoon, Dong Hyun
AU - Sekiguchi, Tetsushi
AU - Shoji, Shuichi
N1 - Publisher Copyright:
© 2017 The Institute of Electrical Engineers of Japan.
PY - 2017
Y1 - 2017
N2 - A new fabrication process of a superrepellent surface using a doubly reentrant structure pillar array was developed. The proposed process applying a soft-lithography is simple, low-cost, and mass-productive process compared to the conventional process. It enables to fabricate a doubly reentrant structure pillar array on glass, silicon, and PDMS substrates.
AB - A new fabrication process of a superrepellent surface using a doubly reentrant structure pillar array was developed. The proposed process applying a soft-lithography is simple, low-cost, and mass-productive process compared to the conventional process. It enables to fabricate a doubly reentrant structure pillar array on glass, silicon, and PDMS substrates.
KW - Contact angle measurement
KW - Doubly reentrant structure
KW - Mold
KW - PDMS
KW - Superrepellent surface
KW - Surface tension
UR - http://www.scopus.com/inward/record.url?scp=85020200755&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85020200755&partnerID=8YFLogxK
U2 - 10.1541/ieejsmas.137.165
DO - 10.1541/ieejsmas.137.165
M3 - Article
AN - SCOPUS:85020200755
SN - 1341-8939
VL - 137
SP - 165
EP - 168
JO - ieej transactions on sensors and micromachines
JF - ieej transactions on sensors and micromachines
IS - 6
ER -