Dielectric properties of plasma-polymerized tetrafluoroethylene films

Toshiki Nakano; Masao Fukuyama; Yoshimichi Ohki

doi:10.1143/JJAP.27.1042

Dielectric properties of plasma-polymerized tetrafluoroethylene films

Toshiki Nakano, Masao Fukuyama, Yoshimichi Ohki

Kagami Memorial Research Institute for Materials Science and Technology

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

A plasma-polymerized tetrafluoroethylene film has dielectric loss peaks below -50degC and approximately at 40degC. The effects of the substrate temperature during polymerization and of plasma irradiation after polymerization on the appearance of the peaks were studied. The low-temperature peak seems to be due to local-mode relaxation of polar groups, while the high-temperature peak seems to be due to phase transition.

Original language	English
Pages (from-to)	1042-1046
Number of pages	5
Journal	Japanese journal of applied physics
Volume	27
Issue number	6R
DOIs	https://doi.org/10.1143/JJAP.27.1042
Publication status	Published - 1988 Jun

Keywords

Dielectric properties
Local mode relaxation
Organic thin film
Phase transition
Plasma polymerization

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.27.1042

Cite this

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title = "Dielectric properties of plasma-polymerized tetrafluoroethylene films",

abstract = "A plasma-polymerized tetrafluoroethylene film has dielectric loss peaks below -50degC and approximately at 40degC. The effects of the substrate temperature during polymerization and of plasma irradiation after polymerization on the appearance of the peaks were studied. The low-temperature peak seems to be due to local-mode relaxation of polar groups, while the high-temperature peak seems to be due to phase transition.",

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author = "Toshiki Nakano and Masao Fukuyama and Yoshimichi Ohki",

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T1 - Dielectric properties of plasma-polymerized tetrafluoroethylene films

AU - Nakano, Toshiki

AU - Fukuyama, Masao

AU - Ohki, Yoshimichi

PY - 1988/6

Y1 - 1988/6

N2 - A plasma-polymerized tetrafluoroethylene film has dielectric loss peaks below -50degC and approximately at 40degC. The effects of the substrate temperature during polymerization and of plasma irradiation after polymerization on the appearance of the peaks were studied. The low-temperature peak seems to be due to local-mode relaxation of polar groups, while the high-temperature peak seems to be due to phase transition.

AB - A plasma-polymerized tetrafluoroethylene film has dielectric loss peaks below -50degC and approximately at 40degC. The effects of the substrate temperature during polymerization and of plasma irradiation after polymerization on the appearance of the peaks were studied. The low-temperature peak seems to be due to local-mode relaxation of polar groups, while the high-temperature peak seems to be due to phase transition.

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KW - Local mode relaxation

KW - Organic thin film

KW - Phase transition

KW - Plasma polymerization

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JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

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ER -

Dielectric properties of plasma-polymerized tetrafluoroethylene films

Abstract

Keywords

ASJC Scopus subject areas

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