TY - JOUR
T1 - Direct observation of the band gap shrinkage in amorphous In 2O3-ZnO thin films
AU - Jia, Junjun
AU - Oka, Nobuto
AU - Shigesato, Yuzo
N1 - Funding Information:
The authors express their deep gratitude to Shin-ichi Nakamura for his assistance with TEM measurements. The synchrotron radiation experiments were performed at the BL47XU of SPring-8 with the approval of the Japan Synchrotron Radiation Research Institute (JASRI) (Proposal No. 2009B1023). This work was supported by New Energy and Industrial Technology Development Organization (NEDO) as a project of “Fundamental Technology Development of Next Generation Lighting of High-efficiency and High-quality,” Japan.
PY - 2013/4/28
Y1 - 2013/4/28
N2 - We investigated the dependence of valence- and core-level photoemission spectra of amorphous In2O3-ZnO (a-IZO) films on carrier density by using hard x-ray photoemission spectroscopy (h ν 8000 eV). The valence band edge distinctly shifts toward high binding energy with the increase in carrier density from 0.80 to 3.96 × 10 20 cm - 3, and an abrupt jump for the shift of the valence band edge from high to low binding energy occurs at a carrier density of 4.76 × 10 20 cm - 3. After considering the effect of nonparabolic bandstructure, the shifts are still less than the width of the occupied conduction band, providing direct evidence for the band gap shrinkage. Our calculation results indicate that the contribution of the band gap shrinkage increases as the carrier density increases, which accords with the observations in doped conducting crystal materials, such as Sn doped In2O 3. Moreover, it is found that the conduction electrons of a-IZO films are strongly perturbed by the ionization of core levels, which leads to obvious plasmon satellites in core photoemission spectra lines.
AB - We investigated the dependence of valence- and core-level photoemission spectra of amorphous In2O3-ZnO (a-IZO) films on carrier density by using hard x-ray photoemission spectroscopy (h ν 8000 eV). The valence band edge distinctly shifts toward high binding energy with the increase in carrier density from 0.80 to 3.96 × 10 20 cm - 3, and an abrupt jump for the shift of the valence band edge from high to low binding energy occurs at a carrier density of 4.76 × 10 20 cm - 3. After considering the effect of nonparabolic bandstructure, the shifts are still less than the width of the occupied conduction band, providing direct evidence for the band gap shrinkage. Our calculation results indicate that the contribution of the band gap shrinkage increases as the carrier density increases, which accords with the observations in doped conducting crystal materials, such as Sn doped In2O 3. Moreover, it is found that the conduction electrons of a-IZO films are strongly perturbed by the ionization of core levels, which leads to obvious plasmon satellites in core photoemission spectra lines.
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U2 - 10.1063/1.4802441
DO - 10.1063/1.4802441
M3 - Article
AN - SCOPUS:84877277570
SN - 0021-8979
VL - 113
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 16
M1 - 163702
ER -