TY - GEN
T1 - Dynamic cell patterning technology based on photocleavable molecules
AU - Jun, Nakanishi
N1 - Copyright:
Copyright 2011 Elsevier B.V., All rights reserved.
PY - 2011
Y1 - 2011
N2 - Dynamic control of cell-substrate interactions is useful for exploring signaling processes involved in cell adhesion and migration as well as patterning heterotypic cells to mimic living tissues. We have developed photoactivatable substrates whose surface was modified with photoreleasable cell-repellent blocking agents. The surfaces are initially non-cell adhesive because of the presence of the blocking agents, but become cell adhesive upon near-UV irradiation of the substrates via the photo-induced desorption of the blocking agents. Here, I overview the developmental process of our photoactivatable substrates and demonstrate their potential uses for bioanalysis.
AB - Dynamic control of cell-substrate interactions is useful for exploring signaling processes involved in cell adhesion and migration as well as patterning heterotypic cells to mimic living tissues. We have developed photoactivatable substrates whose surface was modified with photoreleasable cell-repellent blocking agents. The surfaces are initially non-cell adhesive because of the presence of the blocking agents, but become cell adhesive upon near-UV irradiation of the substrates via the photo-induced desorption of the blocking agents. Here, I overview the developmental process of our photoactivatable substrates and demonstrate their potential uses for bioanalysis.
KW - Array
KW - Caged compounds
KW - Cell adhesion
KW - Cloning
KW - Migration
UR - http://www.scopus.com/inward/record.url?scp=80053089052&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=80053089052&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/AMR.306-307.7
DO - 10.4028/www.scientific.net/AMR.306-307.7
M3 - Conference contribution
AN - SCOPUS:80053089052
SN - 9783037852040
T3 - Advanced Materials Research
SP - 7
EP - 10
BT - Emerging Focus on Advanced Materials
T2 - 1st International Congress on Advanced Materials 2011, AM2011
Y2 - 13 May 2011 through 16 May 2011
ER -