Effect of carbon content on the electrical resistivity of electrodeposited copper

Tetsuya Osaka; Noriyuki Yamachika; Masahiro Yoshino; Madoka Hasegawa; Yoshinori Negishi; Yutaka Okinaka

doi:10.1149/1.3054273

Effect of carbon content on the electrical resistivity of electrodeposited copper

Tetsuya Osaka^*, Noriyuki Yamachika, Masahiro Yoshino, Madoka Hasegawa, Yoshinori Negishi, Yutaka Okinaka

^*Corresponding author for this work

Research Organization for Nano & Life Innovation

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

Copper films electrodeposited from acid sulfate baths containing conventional additives used in the damascene process for the fabrication of ultralarge-scale integration interconnects were analyzed quantitatively to investigate the relation between carbon content and electrical resistivity of the deposit. In the as-deposited state, the resistivity of deposits that did not exhibit self-annealing effects in scanning ion microscope examination increased almost linearly with carbon content in the range of 0.002-0.045 wt %. The deposits that exhibited self-annealing effects showed higher resistivity values at identical carbon contents. After self-annealing, resistivity values of all deposits varied almost linearly with carbon content.

Original language	English
Pages (from-to)	D15-D17
Journal	Electrochemical and Solid-State Letters
Volume	12
Issue number	3
DOIs	https://doi.org/10.1149/1.3054273
Publication status	Published - 2009 Jan 19

ASJC Scopus subject areas

Chemical Engineering(all)
Materials Science(all)
Physical and Theoretical Chemistry
Electrochemistry
Electrical and Electronic Engineering

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abstract = "Copper films electrodeposited from acid sulfate baths containing conventional additives used in the damascene process for the fabrication of ultralarge-scale integration interconnects were analyzed quantitatively to investigate the relation between carbon content and electrical resistivity of the deposit. In the as-deposited state, the resistivity of deposits that did not exhibit self-annealing effects in scanning ion microscope examination increased almost linearly with carbon content in the range of 0.002-0.045 wt %. The deposits that exhibited self-annealing effects showed higher resistivity values at identical carbon contents. After self-annealing, resistivity values of all deposits varied almost linearly with carbon content.",

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AU - Osaka, Tetsuya

AU - Yamachika, Noriyuki

AU - Yoshino, Masahiro

AU - Hasegawa, Madoka

AU - Negishi, Yoshinori

AU - Okinaka, Yutaka

PY - 2009/1/19

Y1 - 2009/1/19

N2 - Copper films electrodeposited from acid sulfate baths containing conventional additives used in the damascene process for the fabrication of ultralarge-scale integration interconnects were analyzed quantitatively to investigate the relation between carbon content and electrical resistivity of the deposit. In the as-deposited state, the resistivity of deposits that did not exhibit self-annealing effects in scanning ion microscope examination increased almost linearly with carbon content in the range of 0.002-0.045 wt %. The deposits that exhibited self-annealing effects showed higher resistivity values at identical carbon contents. After self-annealing, resistivity values of all deposits varied almost linearly with carbon content.

AB - Copper films electrodeposited from acid sulfate baths containing conventional additives used in the damascene process for the fabrication of ultralarge-scale integration interconnects were analyzed quantitatively to investigate the relation between carbon content and electrical resistivity of the deposit. In the as-deposited state, the resistivity of deposits that did not exhibit self-annealing effects in scanning ion microscope examination increased almost linearly with carbon content in the range of 0.002-0.045 wt %. The deposits that exhibited self-annealing effects showed higher resistivity values at identical carbon contents. After self-annealing, resistivity values of all deposits varied almost linearly with carbon content.

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Effect of carbon content on the electrical resistivity of electrodeposited copper

Abstract

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