Effect of fluorine-doping on the dielectric strength of thin SiO2 films formed by plasma-enhanced chemical vapor deposition

K. Ishii*, A. Takami, Y. Ohki

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Fingerprint

Dive into the research topics of 'Effect of fluorine-doping on the dielectric strength of thin SiO2 films formed by plasma-enhanced chemical vapor deposition'. Together they form a unique fingerprint.

Engineering & Materials Science