Effect of heating and cooling rates in annealing for preparation of L10-FePt nanoparticles on Si substrate

Yoshiki Fujihira, Toru Asahi, Toshiyuki Momma*, Tetsuya Osaka

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

In order to obtain highly ordered L10-FePt nanoparticles for hard disk drive applications, the L10-phase transformation of chemically synthesized FePt nanoparticles deposited on a naturally oxidized Si substrate was investigated using rapid thermal annealing. The heating and cooling rates during annealing were changed logarithmically with a constant annealing temperature (800°C) and holding time (10 min). Almost completely ordered L10-FePt nanoparticles were confirmed by grazing incidence X-ray diffraction measurements, irrespective of the heating and cooling rates, and the amount of the silicide changed in response to both. Nearly pure L10-FePt was obtained when rapid heating (more than 780 K/min) and rapid cooling (more than 290 K/min) were applied. L10-FePt degraded into Fe3Si and PtSi when the cooling rate was lower than 7.8 K/min. Rapid heating as well as rapid cooling of FePt nanoparticles can provide a facile route for the high-throughput production of L10-FePt-based high-density magnetic recording media.

Original languageEnglish
Pages (from-to)P217-P222
JournalECS Journal of Solid State Science and Technology
Volume8
Issue number4
DOIs
Publication statusPublished - 2019

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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