Electrical resistivity and microstructures of sputtered CuxMo6S8 films

B. R. Zhao*, R. Ohtaki, H. L. Luo, L. D. Flesner

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


The resistivity of superconducting CuxMo6S8 films prepared by sputtering was measured between 10 and 300 K. Using a scanning electron microscope, the microstructures of the films with different preparation conditions were examined. The broadly varying values of the measured resistivities were explained on the basis of the particular microstructures of the films.

Original languageEnglish
Pages (from-to)185-192
Number of pages8
JournalThin Solid Films
Issue number3
Publication statusPublished - 1983 Dec 16
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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