Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A

Tomoko Gowa Oyama; Kazuyuki Enomoto; Yuji Hosaka; Akihiro Oshima; Masakazu Washio; Seiichi Tagawa

doi:10.1143/APEX.5.036501

Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A

Tomoko Gowa Oyama^*, Kazuyuki Enomoto, Yuji Hosaka, Akihiro Oshima, Masakazu Washio, Seiichi Tagawa

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl ^- ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl ^- ions.

Original language	English
Article number	036501
Journal	Applied Physics Express
Volume	5
Issue number	3
DOIs	https://doi.org/10.1143/APEX.5.036501
Publication status	Published - 2012 Mar

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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@article{39bd6df47d1a4905a2fa2909c1db8f83,

title = "Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A",

abstract = "ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl - ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl - ions.",

author = "Oyama, {Tomoko Gowa} and Kazuyuki Enomoto and Yuji Hosaka and Akihiro Oshima and Masakazu Washio and Seiichi Tagawa",

year = "2012",

month = mar,

doi = "10.1143/APEX.5.036501",

language = "English",

volume = "5",

journal = "Applied Physics Express",

issn = "1882-0778",

publisher = "Japan Society of Applied Physics",

number = "3",

}

TY - JOUR

T1 - Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A

AU - Oyama, Tomoko Gowa

AU - Enomoto, Kazuyuki

AU - Hosaka, Yuji

AU - Oshima, Akihiro

AU - Washio, Masakazu

AU - Tagawa, Seiichi

PY - 2012/3

Y1 - 2012/3

N2 - ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl - ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl - ions.

AB - ZEP520A (1 : 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl - ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl - ions.

UR - http://www.scopus.com/inward/record.url?scp=84858633934&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84858633934&partnerID=8YFLogxK

U2 - 10.1143/APEX.5.036501

DO - 10.1143/APEX.5.036501

M3 - Article

AN - SCOPUS:84858633934

SN - 1882-0778

VL - 5

JO - Applied Physics Express

JF - Applied Physics Express

IS - 3

M1 - 036501

ER -

Electron-beam-induced decomposition mechanisms of high-sensitivity chlorinated resist ZEP520A

Abstract

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