Enhanced oxidation of silicon using a collimated hyperthermal ozone beam

T. Nishiguchi*, Y. Morikawa, M. Miyamoto, H. Nonaka, S. Ichimura

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


Oxidation of silicon by collimated hyperthermal ozone beam produced by pulsed-laser ablation of solid ozone, was reported. This led to decrease in the process temperature and increase in the controllability of oxidation. Laser shots, to which the number of supplied ozone molecules were propotional, were used to control the oxidation rate. Higher oxidation efficieny was reported in comparison with that by using continuous ozone spray with thermal energy.

Original languageEnglish
Pages (from-to)382-384
Number of pages3
JournalApplied Physics Letters
Issue number3
Publication statusPublished - 2001 Jul 16
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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