TY - GEN
T1 - Evaluation of Lasing Temperature Characteristics of 1550nm QD-Based-LDs by IID-QDI Technique with Ar and B Ions and High Temperature Stability
AU - Matsumoto, A.
AU - Isawa, S.
AU - Kaneko, R.
AU - Akahane, K.
AU - Umezawa, T.
AU - Matsushima, Y.
AU - Utaka, K.
N1 - Publisher Copyright:
© 2020 OSA.
PY - 2020/5
Y1 - 2020/5
N2 - We evaluated temperature characteristics of QD-based-LDs by ion-implantation-induced-disordering quantum-dot intermixing technique with Ar and B ions, and demonstrated high temperature stability with a characteristic temperature of 284 K and a wavelength shift of 0.15 nm/°C.
AB - We evaluated temperature characteristics of QD-based-LDs by ion-implantation-induced-disordering quantum-dot intermixing technique with Ar and B ions, and demonstrated high temperature stability with a characteristic temperature of 284 K and a wavelength shift of 0.15 nm/°C.
UR - http://www.scopus.com/inward/record.url?scp=85091632392&partnerID=8YFLogxK
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M3 - Conference contribution
AN - SCOPUS:85091632392
T3 - Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
BT - 2020 Conference on Lasers and Electro-Optics, CLEO 2020 - Proceedings
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2020 Conference on Lasers and Electro-Optics, CLEO 2020
Y2 - 10 May 2020 through 15 May 2020
ER -