Evaluation of strained silicon by electron back scattering pattern compared with Raman measurement and edge force model calculation

Motohiro Tomita*, Daisuke Kosemura, Munehisa Takei, Kohki Nagata, Hiroaki Akamatsu, Atsushi Ogura

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds