Extendibility of proximity x-ray lithography to 25 nm and below

Eijiro Toyota*, Masakazu Washio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)


A procedure to extend the limit of proximity x-ray lithography (PXL) by changing the exposure methods is proposed. In particular, it is shown that PXL can be used at 25 nm and most probably 18 nm design rule by changing the exposure methods corresponding to the gap limit by steppers. The same light source and facility layout can be used throughout the full generations of PXL.

Original languageEnglish
Pages (from-to)2979-2983
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
Publication statusPublished - 2002 Nov

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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