Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography

Zhigang Wu; Weigang Zhang; Zhi Wang; Guiyun Kai; Shuzhong Yuan; Xiaoyi Dong; K. Utaka; Y. Wada

Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography

Zhigang Wu^*, Weigang Zhang, Zhi Wang, Guiyun Kai, Shuzhong Yuan, Xiaoyi Dong, K. Utaka, Y. Wada

^*Corresponding author for this work

School of Fundamental Science and Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm^-1 is obtained.

Original language	English
Pages (from-to)	1347-1350
Number of pages	4
Journal	Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
Volume	27
Issue number	8
Publication status	Published - 2006 Aug

Keywords

Bragg grating
Integrated optics
Rib waveguide
Silicon-on-insulator

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

Cite this

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title = "Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography",

abstract = "The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm-1 is obtained.",

keywords = "Bragg grating, Integrated optics, Rib waveguide, Silicon-on-insulator",

author = "Zhigang Wu and Weigang Zhang and Zhi Wang and Guiyun Kai and Shuzhong Yuan and Xiaoyi Dong and K. Utaka and Y. Wada",

year = "2006",

month = aug,

language = "English",

volume = "27",

pages = "1347--1350",

journal = "Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors",

issn = "0253-4177",

publisher = "Kexue Chubaneshe/Science Press",

number = "8",

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TY - JOUR

T1 - Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography

AU - Wu, Zhigang

AU - Zhang, Weigang

AU - Wang, Zhi

AU - Kai, Guiyun

AU - Yuan, Shuzhong

AU - Dong, Xiaoyi

AU - Utaka, K.

AU - Wada, Y.

PY - 2006/8

Y1 - 2006/8

N2 - The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm-1 is obtained.

AB - The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOI device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30 cm-1 is obtained.

KW - Bragg grating

KW - Integrated optics

KW - Rib waveguide

KW - Silicon-on-insulator

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M3 - Article

AN - SCOPUS:33748996780

SN - 0253-4177

VL - 27

SP - 1347

EP - 1350

JO - Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

JF - Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

IS - 8

ER -

Fabrication and evaluation of Bragg gratings on optimally designed silicon-on-insulator rib waveguides using electron-beam lithography

Abstract

Keywords

ASJC Scopus subject areas

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