Fabrication of 1 μm Gate Diamond FET Using Self-Aligned Gate Process

Hitoshi Umezawa*, Kenich Kitatani, Kengo Kinumura, Nobuyuki Seto, Kazuo Tsugawa, Hiroshi Kawarada

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)151-153
Number of pages3
JournalNew Diamond and Frontier Carbon Technology
Issue number2
Publication statusPublished - 1999 Dec 1


  • Diamond
  • Self-aligned gate process

ASJC Scopus subject areas

  • Materials Science(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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