Fabrication of CoPt magnetic nanodot arrays by electrodeposition process

Takanari Ouchi, Yuki Arikawa, Takayuki Homma*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)


We attempted to fabricate patterned media using the electrochemical deposition process along with nanopatterned substrates prepared by the electron beam lithography (EBL), UV nanoimprint lithography (UV-NIL), and spin-on-glass nanoimprint lithography (SOG-NIL) approaches. CoPt was electrodeposited into the nanopatterned substrates and chemical mechanical polishing was carried out to planarize the surface. It was clarified that CoPt nanodot arrays were successfully deposited into the patterned nanopores fabricated by UV-NIL and SOG-NIL as well as by EBL with high area selectivity and uniformity. The density of the CoPt nanodot arrays deposited into the nanopores fabricated by EBL was equal up to an areal recording density of 250 Gbit/in2.

Original languageEnglish
Pages (from-to)3104-3107
Number of pages4
JournalJournal of Magnetism and Magnetic Materials
Issue number22
Publication statusPublished - 2008 Nov


  • CoPt
  • Electrodeposition
  • Electron beam lithography
  • Nanoimprinting lithography
  • Patterned media

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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