Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Motokazu Yuasa*, Hiroshi Kawarada, Jin Wei, Jing Sheng Ma, Jun ichi Suzuki, Sigenobu Okada, Akio Hiraki

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.

Original languageEnglish
Pages (from-to)374-380
Number of pages7
JournalSurface and Coatings Technology
Volume49
Issue number1-3
DOIs
Publication statusPublished - 1991 Dec 10

ASJC Scopus subject areas

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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