Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography

Akiko Okada; Shuichi Shoji; Hidetoshi Shinohara; Hiromi Nishihara; Hiroshi Goto; Haruo Sunakawa; Toshiharu Matsueda; Akira Usui; Atsushi A. Yamaguchi; Jun Mizuno

doi:10.2494/photopolymer.26.69

Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography

Akiko Okada, Shuichi Shoji, Hidetoshi Shinohara, Hiromi Nishihara, Hiroshi Goto, Haruo Sunakawa, Toshiharu Matsueda, Akira Usui, Atsushi A. Yamaguchi, Jun Mizuno

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Original language	English
Pages (from-to)	69-72
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	26
Issue number	1
DOIs	https://doi.org/10.2494/photopolymer.26.69
Publication status	Published - 2013

Keywords

Dry etching
Hydride vapor phase epitaxy
Light-emitting diode
Nanoimprint lithography

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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10.2494/photopolymer.26.69

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@article{3978ffbc71e24bf1a8d35c8205a81eaf,

title = "Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography",

keywords = "Dry etching, Hydride vapor phase epitaxy, Light-emitting diode, Nanoimprint lithography",

author = "Akiko Okada and Shuichi Shoji and Hidetoshi Shinohara and Hiromi Nishihara and Hiroshi Goto and Haruo Sunakawa and Toshiharu Matsueda and Akira Usui and Yamaguchi, {Atsushi A.} and Jun Mizuno",

year = "2013",

doi = "10.2494/photopolymer.26.69",

language = "English",

volume = "26",

pages = "69--72",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "1",

}

TY - JOUR

T1 - Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography

AU - Okada, Akiko

AU - Shoji, Shuichi

AU - Shinohara, Hidetoshi

AU - Nishihara, Hiromi

AU - Goto, Hiroshi

AU - Sunakawa, Haruo

AU - Matsueda, Toshiharu

AU - Usui, Akira

AU - Yamaguchi, Atsushi A.

AU - Mizuno, Jun

PY - 2013

Y1 - 2013

KW - Dry etching

KW - Hydride vapor phase epitaxy

KW - Light-emitting diode

KW - Nanoimprint lithography

UR - http://www.scopus.com/inward/record.url?scp=84880798834&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84880798834&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.26.69

DO - 10.2494/photopolymer.26.69

M3 - Article

AN - SCOPUS:84880798834

SN - 0914-9244

VL - 26

SP - 69

EP - 72

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 1

ER -

Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography

Keywords

ASJC Scopus subject areas

Access to Document

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