TY - JOUR
T1 - Fabrication of magnetic nanodots array using UV nanoimprint lithography and electrodeposition for high density patterned media
AU - Shinohara, Hidetoshi
AU - Fukuhara, Makoto
AU - Hirasawa, Tamano
AU - Mizuno, Jun
AU - Shoji, Shuichi
N1 - Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.
PY - 2008
Y1 - 2008
N2 - A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.
AB - A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.
KW - Chemical mechanical polishing
KW - Electrodeposition
KW - Magnetic nanodots array
KW - UV nanoimprint lithography
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U2 - 10.2494/photopolymer.21.591
DO - 10.2494/photopolymer.21.591
M3 - Article
AN - SCOPUS:50849104595
SN - 0914-9244
VL - 21
SP - 591
EP - 596
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
IS - 4
ER -