Fabrication of metallic nanopatterns using the vacuum type UV-NIL equipment

Makoto Fukuhara*, Jun Mizuno, Mikiko Saito, Takayuki Homma, Shuichi Shoji

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)


Nanoscale dot patterns of cobalt alloy were formed on a silicon substrate using the ultra-violet nanoimprint lithography (UV-NIL) technology in combination with an electrodeposition process. We developed an improved UV-NIL equipment that can evacuate the chamber during imprinting. Using this equipment, we successfully imprinted 240-nm dot patterns with 500 nm pitch on a photocurable resin with high dimensional accuracy. Thickness control of the resin and imprinting under vacuum are important issues to obtain fine nanopatterns. Using these resin patterns as a mask layer, 300-nm cobalt alloy patterns are successfully formed by the electrodeposition process.

Original languageEnglish
Pages (from-to)307-312
Number of pages6
JournalIEEJ Transactions on Electrical and Electronic Engineering
Issue number3
Publication statusPublished - 2007 May


  • Electrodeposition
  • Metallic nanopatterns
  • Nanoimprint
  • Photocurable resin
  • Vacuum type

ASJC Scopus subject areas

  • Electrical and Electronic Engineering


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