Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

R. Negishi; T. Hasegawa; K. Terabe; M. Aono; T. Ebihara; H. Tanaka; T. Ogawa

doi:10.1063/1.2209208

Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

R. Negishi^*, T. Hasegawa, K. Terabe, M. Aono, T. Ebihara, H. Tanaka, T. Ogawa

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

64 Citations (Scopus)

Abstract

We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be formed with high-resolution patterning by using electron beam lithography. We have demonstrated the utility of the fabricated nanogaps by measuring a single electron tunneling phenomenon through dodecanethiol-coated Au nanoparticles placed in the fabricated nanogap.

Original language	English
Article number	223111
Journal	Applied Physics Letters
Volume	88
Issue number	22
DOIs	https://doi.org/10.1063/1.2209208
Publication status	Published - 2006 May 29
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2209208

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title = "Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques",

abstract = "We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be formed with high-resolution patterning by using electron beam lithography. We have demonstrated the utility of the fabricated nanogaps by measuring a single electron tunneling phenomenon through dodecanethiol-coated Au nanoparticles placed in the fabricated nanogap.",

author = "R. Negishi and T. Hasegawa and K. Terabe and M. Aono and T. Ebihara and H. Tanaka and T. Ogawa",

note = "Funding Information: The authors would like to thank Dr. W. Huang of the Institute for Molecular Science (IMS), Japan for supporting experiment on the measurements. The authors also thank H. Ozawa of the IMS for preparing the dodecanethiol-coated Au nanoparticles. A part of this work was supported by the Nanotechnology Support Project of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan.",

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AU - Negishi, R.

AU - Hasegawa, T.

AU - Terabe, K.

AU - Aono, M.

AU - Ebihara, T.

AU - Tanaka, H.

AU - Ogawa, T.

N1 - Funding Information: The authors would like to thank Dr. W. Huang of the Institute for Molecular Science (IMS), Japan for supporting experiment on the measurements. The authors also thank H. Ozawa of the IMS for preparing the dodecanethiol-coated Au nanoparticles. A part of this work was supported by the Nanotechnology Support Project of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan.

PY - 2006/5/29

Y1 - 2006/5/29

N2 - We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be formed with high-resolution patterning by using electron beam lithography. We have demonstrated the utility of the fabricated nanogaps by measuring a single electron tunneling phenomenon through dodecanethiol-coated Au nanoparticles placed in the fabricated nanogap.

AB - We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be formed with high-resolution patterning by using electron beam lithography. We have demonstrated the utility of the fabricated nanogaps by measuring a single electron tunneling phenomenon through dodecanethiol-coated Au nanoparticles placed in the fabricated nanogap.

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Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

Abstract

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