Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting

Nobuya Hiroshiba; Wataru Yano; Ryuji Okumura; Yo Ichikawa

doi:10.1587/transele.E98.C.133

Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting

Nobuya Hiroshiba, Wataru Yano, Ryuji Okumura, Yo Ichikawa

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm² square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.

Original language	English
Pages (from-to)	133-135
Number of pages	3
Journal	IEICE Transactions on Electronics
Volume	E98C
Issue number	2
DOIs	https://doi.org/10.1587/transele.E98.C.133
Publication status	Published - 2015 Feb 1
Externally published	Yes

Keywords

Flexible devices
Ion-conductive polymer
Nafion
Nanoimprinting

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1587/transele.E98.C.133

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title = "Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting",

abstract = "We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm2 square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.",

keywords = "Flexible devices, Ion-conductive polymer, Nafion, Nanoimprinting",

author = "Nobuya Hiroshiba and Wataru Yano and Ryuji Okumura and Yo Ichikawa",

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language = "English",

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publisher = "Maruzen Co., Ltd/Maruzen Kabushikikaisha",

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AU - Hiroshiba, Nobuya

AU - Yano, Wataru

AU - Okumura, Ryuji

AU - Ichikawa, Yo

PY - 2015/2/1

Y1 - 2015/2/1

N2 - We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm2 square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.

AB - We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm2 square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.

KW - Flexible devices

KW - Ion-conductive polymer

KW - Nafion

KW - Nanoimprinting

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JF - IEICE Transactions on Electronics

IS - 2

ER -

Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting

Abstract

Keywords

ASJC Scopus subject areas

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