Fabrication of polymer and metal three-dimensional micromesh structures

Hironobu Sato*, Yoshitaka Houshi, Toshiharu Otsuka, Shuichi Shoji

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


This paper presents the fabrication methods of polymer and metal three-dimensional (3-D) micromesh structures. The photoresist micromesh structures were formed using multiple inclined UV exposure from the backside of the SU-8 coated glass substrate with metal patterns. A few micrometer-size pillars and pores were realized by optimizing the UV lithography conditions. The 3-D macroporous-mesh Ni structures were also fabricated using electroplating. The inverse-mesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni meshes of about 3 μm in diameter were obtained by this method.

Original languageEnglish
Pages (from-to)8341-8344
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number12
Publication statusPublished - 2004 Dec


  • 3-D micromesh structures
  • Electroplating
  • Multiple inclined UV exposure
  • Photoresist molds
  • SU-8

ASJC Scopus subject areas

  • General Engineering
  • General Physics and Astronomy


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