Fabrication of Sputtered Low-strain, Low-loss SiN Waveguide for Optical Phased Array Device

Masaki Nishimura, Hayato Takemura, Toshimasa Umezawa, Wittawat Yamwong, Tetsuya Kawanishi, Naokatsu Yamamoto, Nipapan Klunngien

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We fabricated sputtered SiN-waveguides with film stress-free, low-loss waveguide at room temperature for optical phased array devices. The beam steering performance was also estimated using the sputtered thick SiN waveguide.

Original languageEnglish
Title of host publication25th Opto-Electronics and Communications Conference, OECC 2020
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728154459
DOIs
Publication statusPublished - 2020 Oct 4
Event25th Opto-Electronics and Communications Conference, OECC 2020 - Taipei, Taiwan, Province of China
Duration: 2020 Oct 42020 Oct 8

Publication series

Name25th Opto-Electronics and Communications Conference, OECC 2020

Conference

Conference25th Opto-Electronics and Communications Conference, OECC 2020
Country/TerritoryTaiwan, Province of China
CityTaipei
Period20/10/420/10/8

Keywords

  • SiN
  • optical phased array
  • sputtering
  • stress-free

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Fingerprint

Dive into the research topics of 'Fabrication of Sputtered Low-strain, Low-loss SiN Waveguide for Optical Phased Array Device'. Together they form a unique fingerprint.

Cite this