Facile patterning of hybrid CdSe nanoparticle films by photoinduced surface defects

Yushin Park, Mary Jane Felipe, Rigoberto C. Advincula*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)


The photopatterning of CdSe quantum dots (QDs) films is facilitated by preparing defect-rich QDs on selective sites on the film. A key step is UV irradiation in the presence of a polar solvent such as methanol in situ as a "developer" which readily dissolves trioctylphosphine oxide (TOPO) but not the QDs. This results in a dramatically reduced photopatterning time and irradiation intensity requirement. The optical property changes were examined by UV-vis and fluorescence spectroscopy. Furthermore, the photo-oxidized pattern of the CdSe QD film was readily observed by fluorescence microscopy. The chemical change due to attenuation of the P=O vibration of TOPO (due to its removal) could be detected by FT-IR imaging or FT-IR chemical mapping. Thus, the protocol is a simple yet effective way of patterning PL properties of QD films at much reduced exposure time compared to previously reported methods. It may find utility for a host of cell-based film assays and PL display device applications at various resolutions.

Original languageEnglish
Pages (from-to)4363-4369
Number of pages7
JournalACS Applied Materials and Interfaces
Issue number11
Publication statusPublished - 2011 Nov 23
Externally publishedYes


  • CdSe
  • hybrid
  • micropatterning
  • photobleaching
  • quantum dots
  • UV irradiation

ASJC Scopus subject areas

  • General Materials Science


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